Filmetrics offers several instruments that measure photoresist thickness and etch rate, both in single-spot and mapping configurations. Although successful measurement of photoresist thickness requires accounting for unique challenges*, in all cases our general-purpose instruments can be used (see table below).
|Thickness Range*||Application||Product Line|
|1nm - 3mm||Single Spot||F20 / F3-sX|
|0.1µm - 2mm||Single Spot||F70-NIR|
|3nm - 3mm||Thickness Mapping||F50|
|1nm - 3mm||Cassette-to-Cassette||F60-c|
Measurement of SU-8, Dow BCB, and other thick photoresists is a particularly important application since spin coating, though quick and easy, can be an inaccurate method for yielding a desired thickness. Since exposure time is dependent on resist thickness, an accurate measurement should be taken. Moreover, since positive and negative photoresists can be used together to create complex multilayer MEMS structures, knowing the thicknesses of each layer becomes extremely important. Our F3-sX is especially good at measuring thick resists, even those opaque in the visible light region. Single-spot and mapping versions are available.
Filmetrics offers a range of tabletop and mapping solutions for measuring the thickness of single layer, multilayer, and even freestanding photoresist films from 1 nm to 3 mm. All Filmetrics models measure thickness (and index) by accurately modeling spectral reflectance. Special proprietary algorithms allow robust "one-click" analysis, with results typically available in less than a second.
*These challenges include not exposing the resist with the measurement light source, having access to a refractive index library that covers the extensive range of photoresists, and having the ability to deal with photoresist’s tendency to change refractive index with the degree of baking and exposure.
For photoresist measurements, contact any of our thin-film experts.
Filmetrics offers free trial measurements - results are typically available in 1-2 days.
Thickness Measurement Example
Photoresist etch rate is critical for both the development of new resist materials as well as process improvements for standard resists. Typically, etch rate has been obtained with either an in-house developed instrument, or a commercial system. Both approaches can prove to be extremely expensive. We show here an etch experiment with our single-spot F20 instrument. It is trivial to account for etch-solvent index effects with FILMeasure software, and results are conveniently displayed in our History tab. In this case, the etch rate is quite linear. Other behaviors: layer swell followed by etch or layer segregation can also be studied. Measurement interval (acquisition time) can be easily controlled by the user from a few milliseconds to many minutes depending on the kinetics of your resist. Fast, reliable, and cost effective!
Thickness Measurement Example
The ability to measure the thickness of photoresist coatings is critical to the development and manufacturing of various semiconductor devices like MEMS. Filmetrics offers a wide range of solutions for measuring the thickness of SU-8 and other photoresists. In this example, we demonstrate a quick and effective way of measuring the thickness of SU-8 coatings on Si using our F20 and F50 instruments for single and multi-point measurements, respectively.
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Amorphous & Polysilicon
Measure thickness, crystallinity, and n and k of all forms of amorphous and polycrystalline silicon.
Our F80 Thickness Imaging products are used to measure oxide, STI, and metal CMP processes.
Filmetrics stocks instruments that measure the thousands of dielectric films used throughout industry.
CVD, dielectrics, barrier, PECVD, passivation, insulator, protection, Al2O3, CoO, ZnO, MoO, TiO2, Cr2O3, Nb2O5
Filmetrics systems are used widely in the automotive industry to verify hardcoat and primer thickness.
Acrylic, Automotive industry, Chemical resistance, Clear coating, Decorative coating, Hardcoat, Eyewear, Face shield, Hardcoat, Hardness, Interpenetration Layer, Marring, Ophthalmic lens, Optical quality, Plastic lens, Polycarbonate, Polyester, Siloxane, Primer, Protective film, Scratch resistant, Screen protection, Surface finish, Surface protection, Thermal cure, Top coating, Touch screen, UV coating, UV cure
IC Failure Analysis
The F3-sX is used throughout the chip making industry to measure backside thinning of silicon.
Failure Analysis, FA, Silicon, Si, Integrated circuit, IC, Polishing, Backside failure analysis, Silicon thinning
ITO & Other TCOs
Proprietary analysis algorithms allow one-click measurement of TCO thickness, index, and k.
Indium tin oxide, ITO, tin-doped indium oxide, Transparent conductive oxide, TCO, Display, Front contact, Transparent Electrode, LED, LCD, Solar, Fluorine-doped tin oxide, FTO, TEC, TEC glass, Aluminum zinc oxide, AZO, Aluminum-doped zinc oxide, Zinc oxide, iZO, Indium zinc oxide, IZO, zinc-doped indium oxide
Measure thickness of angioplasty balloons, stent and implant coatings, and many others.
Stents, drug-coated stents, Drug-coating, Balloons, Angioplasty, Parylene, Microfluidic device, Air gap, Catheter, Membranes
Measure thickness, index, and k of metal films up to 50nm thick.
Metallized, Metallization, Foils, Stents, Mirrors, Steel, Stainless Steel, Gold, Nickel, Aluminium, Silver, Cobalt, Zinc, Molybdenum, Titanium, Chrome, Chromium, Niobium, Tungsten, Gallium, Germanium
Measure thickness and index of NPB, AlQ3, PEDOT, P3HT, soluble Teflons, etc…
PLED, AMOLED, Hole Transport (HT), Hole Injection Layer (HIL), Host Materials, anode, cathode, Alq3, NPB, phenylene vinylene, carbazole, thiophene, aniline, styrenesulfonate, phthalocyanine, naphthalene, fluorene, lithium, silver, ITO, calcium
Use the F10-AR to measure reflectance and color, as well as AR and hardcoat layer thicknesses.
eyeglasses, HC, hardcoat, scratch resistant, AR, anti-reflection, reflectance, UV curable, hydrophillic, polycarbonate, high index, CR39, MR-6, MR-7, Trivex
Simply set your parylene-coated sample on the stage of the F3-CS to measure its thickness!
We’ve measured dozens of different resists, and can generate index files for any resist you use.
SU-8, resist, Photoresist, PR, AZ, AZP, ZEP, positive, negative, g-line, i-line, KrF, PMMA, FEP, GRX, KMPR
Measure thickness, porosity, refractive index, and k of your porous silicon films.
Filmetrics offers a full range of products for measuring semiconductor process films.
Refractive Index & k
Measure refractive index and extinction coefficient over wavelengths as wide as 190-1700nm.
n & k, complex, real , imaginary, refractive index, absorption, extinction coefficient, indices, Kramers-Kronig, optical dispersion, dielectric, Lorentz, Cauchy, photoresist, anomalous dispersion, path length
Silicon Wafers & Membranes
We offer tabletop, mapping, and production systems for measuring silicon up to 2mm thick.
Measure CdTe, CdS, CIGS, amorphous-Si, TCOs, anti-reflection (AR) layers, and more...
Copper indium gallium diselenide, CIGS, Cadmium telluride, CdTe, Cad tel,, Amorphous silicon, Amorphous Si, a-Si, Cadmium sulfide, CdS, window layer, buffer layer, Thin-film photovoltaic, Thin-film PV, TFPV, photovoltaics, Solar, Solar cells, Inline, In-situ, Roll-to-roll, R2R, Evaporation, Sputtering, CVD, MOCVD, PECVD, Transparent conductive oxide, TCO, Indium tin oxide, ITO, tin-doped indium oxide
Semiconductor Teaching Labs
More than fifty Filmetrics F20s have been delivered for use in university teaching labs.
Surface Roughness & Finish
3-dimensional surface profile measurements to characterize surface roughness.
Filmetrics systems are widely used in the polymer-films community to measure thickness in-line.
Roll to roll, Roll measurements, Roll systems, Rolling substrate, Roll fed, Roll web, Reel to reel , R2R, Web coater, Autoweb, In-line, In-line monitor, Online thickness, Line monitoring system, Precision measuring tools, Automatic, Feeding, Production, Multipoint, High speed