The Most Powerful Instruments Available for Monitoring Thin-Film Deposition
Measure deposition rates, film thickness, optical constants (n and k), and uniformity of semiconductors and dielectric layers in real-time with the F30 spectral reflectance system.
Example Layers
MBE and MOCVD: Smooth and translucent, or lightly absorbing films, may be measured with the F30 thickness measurement series instruments. This includes virtually any semiconducting material, from AIGaN to GaInAsP.