Thin-film thickness on samples up to 300mm is easily mapped with the F54-XY advanced spectral reflectance system. F54-XY-200 configurations measure samples up to 200mm using a motorized X-Y stage that moves automatically to specified measurement locations, facilitating thickness measurements as quickly as two points per second. Measurements of 300mm wafers are supported by the additional high performance rotary stage in the F54-XYT-300 configuration.

Choose one of the dozens of predefined polar, rectangular, or linear map patterns, or create your own with no limit on the number of measurement points on our automated film thickness mapping system. The systems support measurement of unpatterened and patterned samples using pattern recognition software.

Different models of the F54-XY are distinguished primarily by film thickness and wavelength range. Generally, shorter wavelengths (e.g. F54-XY-200-UV) are required for measurement of thinner films, while longer wavelengths allow measurement of thicker, rougher, and more opaque films.